Home  |   Company  |   Products  |   ASSA Partners  |   Careers  |   Contact Us
 +Advanced Spatial Signature Analysis
 +Defect Knowledge Database with ASSA
ˇˇ
ˇˇ
HOME > PRODUCTS > ADVANCED SPATIAL SIGNATURE ANALYSIS
ˇˇ

AOVtech has developed a 3rd generation ASSA that can automatically recognize the defect spatial distribution patterns, or ˇ°signaturesˇ± from defect files without human reviewing. These signatures point out the potential sources of defects from specific process tools. ASSA can quickly identify potential process equipment problems.

Three ASSA Applications:
1.Search finds defect signatures of defect files from a defect file database.
2.Production finds defect signatures from defect files when they are received from inspection tools ¨C before human review.
3.Early Warning finds early signs of defect signatures that are being built-up from gradual decaying or drifting from process tools.

Example:

Built-in Signature Libraries without training, a key features of ASSA which
Contain a rich library of pre-defined or built-in defect patterns. This pre-defined library provides a consistent standard for all the fabs of a company. This ˇ°no operator trainingˇ± feature eliminated the major problems of 1st and 2nd generation SSA, because ˇ°bad samplesˇ± had been trained to system.



ˇˇ
Features
  • Rich set of default pattern attributes available for rule definition or SPC
    • Pattern Severity (Patent Pending)
    • Count and size of scratches, clusters, micro-scratches
    • Pattern density, size, topology
    • Texture properties: stripes and blisters
  • Zone defining tools
    • Templates for cross correlation
    • Multi-zone
    • Step and Repeat for die or reticule defects
  • Pattern Editing - allows users to add and remove defects on a wafer to define customer patterns.
  • Define defect signatures using scripts or attribute grammars. (> 30 predefined built-in library of signatures)
  • Applying Artificial Intelligence (AI) and fuzzy logic to handle noise, and variations
  • Pattern Matching gives exact match or best guess with confidence levels
  • One or more pattern libraries may be used simultaneously, including built-in libraries or libraries customized to layer/step/device
  • Web based reporting and summary, and email triggering
 
 
 
Copyright 2007-2008 AOV Technologies Co. Ltd